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69. WS Kim, Y Lee, YJ Cho, BK Kim, KT Park and O kim, Effect of Light Intensity and Wavelength on a-Ingazno Thin Film Transistors Under Negative Bias Illumination Stress, The Electrochemical Society, 229th ECS Meeting, 2016

68. YJ Cho, Y Lee, WS Kim, BK Kim, KT Park and O kim, Mechanism of Hump Phenomenon in the IV Characteristics of Amorphous in-Ga-Zn-O Thin Film Transistors Under Positive Bias and Illumination Stress, The Electrochemical Society, 229th ECS Meeting, 2016

67. K. H. Lee and O. kim, Effect of access length on I-V Characteristic of Graphene memory, Proceedings of the 28th International Microprocesses and Nanotechnology Conference (MNC 2015), Toyama, Japan, Nov. 2015

66. K. H. Lee and O. Kim, "Al2O3/HfO2/Al2O3/Graphene Charge Trap Flash Device with a Self-aligned Gate", SSDM 2015, Sapporo, Hokkaido, Japan

65. Y Lee, S Seok, BK Kim, SH Kim, TK Lee, and O Kim, "Effect of Rising Edge in Dynamic Stress with Various Duty Ratio in Amorphous Ingazno Thin Film Transistor", The Electrochemical Society, 227th ECS Meeting, 2015

64. S. Ban and O. kim, Uniform Bipolar Switching, Large On/Off Window, and Low Power in HfOx-based ReRAM with a Thin Barrier Layer, Proceedings of the 26th International Microprocesses and Nanotechnology Conference (MNC 2013), Sapporo, Hokkaido, Japan, Nov. 2013.

63. S. Moon, J. Lee, B. Kim, and O. Kim. "Highly reliable a-Si TFTs gate driver with voltage control function according to threshold voltage shift and temperature change", Accepted to the AM-FPD 13, Kyoto, Japan, July, 2013

62. D. Lee, K. Lee, K. Kim, and O. Kim. "New Analytical Drain Current Model for Graphene Field-Effect Transistors in the Low Carrier Density Limit", Accepted to the 11th Nano Korea 2013 symposium, Seoul, Korea, July 2013.

61. J. Lee, S. Lee, H. Oh and O. Kim. Metrology Analysis of Sub-100 nm Grating Patterns using High Precision Transmission Small Angle X-ray Scattering Technique, Accepted to the 25th International Microprocesses and Nanotechnology Conference, Kobe, Japan, Oct 2012.

60. S. Lee, J. Lee, S. Ban, H. Oh, B. Nam, S. Kim, D. Yim, and O. Kim. A Novel Technique for the Non-Destructive Measurement of EUV Mask Sidewall Angle by using Field-Emission CD-SEM and its Analysis, Accepted to the 10th Nano Korea 2012 symposium, Seoul, Korea, Aug 2012.

59. S. Lee, J. Lee, S. Ban, H. Oh, B. Nam, S. Kim, D. Yim, and O. Kim. An Estimation of the Mask Shadow Effect and its Compensation as Flexible Illumination system in EUVL, Abstract Proceedings of 2012 International Workshop on EUVL, Maui, Hawaii, USA, June 2012.

58. J. Lee, S. Lee, C. Kim, Y. Kim, S. Kim and O. Kim. An Optimized Multi-grid Strategy for Accurate Flare Modeling with 3D Mask Effect in EUV Lithography, Proceedings of 24th International Microprocesses and Nanotechnology Conference, Japan, 2011.10

57. B. Park, J. Lee and O. Kim. Effect of Glycerol on Electrical Properties of PMDs and Morphology of Polymer Films used as Nonvolatile Polymer Memory Device based on Glycerol-modified PEDOT: PSS, Accepted to Journal of Nanoscience and Nanotechnology, 2011.

56. Dongheon Lee, Junhwan Lee, Ohyun Kim, "Pocess Optimization for Synthesis of High-quality Graphene Films by Low Pressure Chemical Vapor Deposition", 2011.10 International Microprocesses and Nanotechnology Conference, Japan.

55. J. Lee, S. Lee and O. Kim. EUVL Flare Modeling with an Improved Accuracy for Feasibility Study of Sub-22 nm HP Node, Abstract Proceedings of 2010 International Workshop on EUVL, Maui, Hawaii, U.S.A, 2011.6

54. Young-Ju Park, Su-Jeong Seok, Sang-Ho Park, and Ohyun Kim, Embedded Touch Sensing Circuit using the Body Capacitance for AMOLED Display, 2010.12 IDW 2010.

53. Su-Jeong Seok, Young-Ju Park, Sang-Ho Park and Ohyun Kim Effective Method for Electrode Pattern Positioning in Touch Screen Panel, 2010.12 IDW 2010.

52. Dae-hyun Moon, Jae-joon Song, and Ohyun Kim, Simplified Model of the Effect of Source/Drain Doping Gradienton Capacitance and Resistance in a Double-Gate MOSFET , 2010.11 International Microprocesses and Nanotechnology Conference, Japan.

51. Kangyoo Song, Junhwan Lee, Yongdae Kim, Changreol Kim Oscar Han and Ohyun Kim, Feasibility Study of a Mask level Correction Strategy for EUV Flare Compensation ,2010.11 International Microprocesses and Nanotechnology Conference, Japan.

50. Boongik Park , Junhwan Lee, and Ohyun Kim Effect of Glycerol on Electrical Properties of PMDs and Morphology of Polymer Films used as Nonvolatile Polymer Memory Device based on Glycerol-modified PEDOT:PSS, 2010.11, AsiaNANO 2010.

49. Jungmoo Lee and Ohyun Kim, Non-volatile resistive memory device based on Poly(3,4- ethylenedioxythiophene):Poly(styrene sulfonate) thin film for transparent and flexible application., 2010.11 International Microprocesses and Nanotechnology Conference, Japan.

48. Kangyoo Song, Junhwan Lee, Changreol Kim, Yongdae Kim, Ohyun Kim An Investigation of Flare Value at Mask Edge Region in EUVL, 2010.06 2010 International Workshop On EUV Lithography, Maui, Hawaii,.

47. Young-Ju Park, Su-Jeong Seok, Sang-Ho Park and Ohyun Kim Embedded Multi-Touch Sensing Circuit using the Mutual Capacitance for AMOLED Display. 2010.07 The 17th International Workshop on Active-Matrix Flat Panel Displays and Devices, Japan .

46. Jae-Joon Song, Daehyun Moon and Ohyun Kim, "The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs", 2009.1118, International Microprocesses and Nanotechnology Conference, Japan

45. Boongik Park and Ohyun Kim, "Nonvolatile polymer memory device based on Glycerol-modified Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonate) (G-PEDOT:PSS)", 2009.1118, International Microprocesses and Nanotechnology Conference, Japan

44. Jun-Hwan Lee, Ganyu Song, Ohyun Kim, "A Study of Flare Variation in Extreme Ultraviolet Lithography for Sub-22nm Line and Space Pattern", 2009.1118, International Microprocesses and Nanotechnology Conference, Japan

43. Sang-Ho Park, Myoung-Hoon Jung, Youngju Park and Ohyun Kim, Hoon-Ju Chung, "Analysis of the cathode voltage distribution in AMOLED Displays", 2009.0916, The 29th International Display Research Conference, EURODISPLAY 2009, Itary

42. Jun-Hwan Lee, Ohyun Kim "An Investigation of the Impact of Mask Shadowing Effect on Flare in Extreme Ultraviolet Lithography", 2009.0715, International Workshop On EUV Lithography, Honolulu, Hawaii

41. Young-Ju Park, Myoung-Hoon Jung, Sang-Ho Park and Ohyun Kim, "Voltage Programming Based Pixel Circuit to Compensate Threshold Voltage and Mobility using a Natural Capacitance of Organic Light Emitting Diode (OLED)", 2009.0703 , The 16th International Workshop on Active-Matrix Flat Panel Displays and Devices, Japan .

40. Jaejoon Song, Daehyun Moon, Ohyun Kim, "Influence of geometrical fin parameters on Id-Vgs Characteristics in Triple-Gate FinFETs", 2008.1027, Microprocesses and Nanotechnology Conference, Japan.

39. Mijung Kim, Ohyun Kim, "Unipolar Unipolar resistance switching in polymeric resistance random access memories", 2008.1027, Microprocesses and Nanotechnology Conference, Japan.

38. Heonjun Ha, Ohyun Kim, "Unipolar Switching Characteristics of Non-volatile Memory Devices Based on Poly(3,4-ethylenedioxythiophene):Poly(styrenesulfonate) (PEDOT:PSS) Thin Films", 2008.0924, 2008 International Conference on Solid State Devices and Materials , Japan.

37. Mijung Kim, Ohyun Kim, "Unipolar memory operation of resistance RAM(RRAM) using Compliance Current Controller", 2008.0924, 2008 International Conference on Solid State Devices and Materials, Japan.

36. Heonjun Ha, Jungmoo Lee, Mijung Kim, Ohyun Kim, "Effect of Various Electrode Materials in Non-Volatile Memory Device Using Poly(3,4-Ethylenedioxythiophene):Poly(Styrenesulfonate) (PEDOT:PSS) Thin Films", 2008.0608,, 3rd International Conference Smart Materials, Italy.

35. Dongjin Lee, Jiyoun Seungchul Choi, Moonhor Ree, and Ohyun Kim, "Novel Sub-10nm Polymer Thin Film Resistance Switching Device", SSDM 2007, P-10-2, Tsukuba

34. Mijung Kim, Seungchul Choi, Joungmoo Lee, Heonjun Ha, Moonhor Ree and Ohyun Kim, The same direction voltage sweep switching characteristics in PI-biphenyl carbamyl films, 2007.7.23~27, HCIS 15, MoP-42, Tokyo.

33. Myoung-Hoon Jung, Inho Choi Ohyun KIm and Hoon-ju Chung, "AMOLED Pixel Structures Compensating the Hysteresis of Poly-Si TFTs", 2007.5.22~25, SID 2007, pp. 226~229, Long  Beach.

32. Sang-hyunHong, Jiyoun Kim, Dongjin Lee, Heonjun Ha, Jeongmoo Lee, Moonhor Ree, Ohyun Kim, Current-voltage (I-V) characteristics of the polymer device using polyaniline derivatives, 2007.2.8~9, The 14th Korean Conference on Semiconductors, FP1-3, Cheju

31.Jaejoon Song and Ohyun Kim "Double Hump Phenomenon of Body-Tied FinFETs with Channel Doping", The 14th Korean Conference on Semiconductors, Seogwipo, Korea, pp. 1029-1030, Feb. 8-9, 2007

30.Myoung-Hoon Jung, Inho Choi, Ohyun Kim and Hoon-Ju Chung "A new voltage driven AMOLED pixel circuit for compensating the hysteresis of the Poly-silicon TFTs", 2007.2.8~9, The 14th Korean Conference on Semiconductors, TD1-3, Cheju

29. Dongjin Lee1, Jiyoun Kim2, Sanghyun Hong, Heonjun Ha,Daehyun Moon1, Moonhor Ree, and Ohyun Kim, "High  performance Non volatile memory cell   based on a conjugated polymer", MNC2006 (Microprocesses and Nanotechnology Conference), Vol.2006, pp.368-369, Kanagawa, Japan

28. Myoung-Hoon Jung, Inho Choi, Ohyun Kim, Tae-Youn Kim, Yong-Won Shin, and Hoon-Ju Chung, "New voltage programmed AMOLED pixel circuit   with 3TFTs and 2Capacitors", AM-FPD06 Digest of Technical Paper, Vol.2006, pp.243~246,The Japan Society of Applied Physics, (20060706)

27.Myoung-Hoon Jung, Inho Choi, Ohyun Kim, Tae-Youn Kim, Yong-Won Shin and Hoon-Ju Chung, A New Voltage Programmed AMOLED Pixel Circuit using Reference Current, 2005.12.6~9, IDW 2005, OLEDp /AMDp -9L, Takamatsu, Japan

26.Sang-hyun Hong, Dongjin Lee, Ohyun Kim, Jiyoun Kim, Moonhor Ree, Electrical Bistable Behavior in the Current-Voltage Characteristics of Switching Devices Based on Polyaniline Derivatives, 2005.11.29, 2005 MRS Fall Meeting, Boston

25.Myoung-Hoon Jung, Ohyun Kim and Hoon-Ju Chung, Voltage distribution of power source in large-size AMOLED displays, 2005.3.14~15, ITC 2005, pp.219~222, Seoul

24.Myoung-Hoon Jung, Young-Ju Park and Ohyun Kim, "A New Voltage Driven Pixel Circuit for AMOLED ", 2005.2.24~25, The 12th Korean Conference in Semiconductors, D-16, Seoul

23.Youn-yeol Lee, Sang-hyun Hong, Dongjin Lee, Ohyun Kim, A Study on the Polymer Memory Device, 2005.2.24The 12th Korean Conference in Semiconductors, G-27, COEX Conference Center, Seoul

22.Young-ju Park, Jin Huh, Byeong-koo Kim, Myoung-hoon Jung and Ohyun Kim, A New Voltage Driven Pixel Circuit for Large Sized AMOLED Panel, 2004.12.8~10,11th IDW, pp.539~540, Osaka

21.Jeong-Ah Ahn and Ohyun Kim,Effects of Self-Aligned Field Induced Drain with Double Spacer on the Characteristics of Pol-Si TFT, 2003 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices June 30 – July 2, 2003 Marriot Hotel, Busan, Korea

20. Eunsung Seo, Ohyun Kim, Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography XEL, MNC, Yokohama, July 2000

19. Youngduck Seo, Ohyun Kim, Evaluation of effective image blurring factors in the synchrotron Proximity x-ray lithography simulation XEL, MNC, Yokohama, July 2000

18. Eunsung Seo, Bo-Kyoung Choi, and Ohyun Kim, "Determination of proximity effect parameters and the shape bias parameter in electron beam lithography", Extended Abstract of Micro and Nano Engineering 99, Rome Italy, Sep. 1999

17. Y. Seo, K. Lee, M. Yi, B.K. Choi, Ohyun Kim, I. Raptis, P. Argitis, M. Hatzakis, "Evaluation of advanced epoxy novolac resist, EPR, for sub-100nm synchrotron x-ray proximity lithography", Extended Abstract of Micro and Nano Engineering 98, Leuven Belgium, Sep. 1998

16. Moonsuk Yi, Eunsung Seo, Yongduk Seo, Kyoungho Lee and Ohyun Kim, "Characterization of Proximity Correction in 0.1m Regime X-Ray Lithography", Extended Abstract of Micro processes and Nanotechnology 98, Kyungju Korea, July 1998

15. Moonsuk Yi, Y. Seo, E. Seo, J. Yang, K. Lee, B.K. Choi and Ohyun Kim, "Characterization of pattern geometry effect on line end shortening in x-ray lithography", Extended Abstract of International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Chicago, May 1998

14. Bo-Kyoung Choi, Jinsuk Yang, Kyoungho Lee and Ohyun Kim, "Characterization of Acid Diffusion for Negative Chemically Amplified Resist using X-Ray Proximity Lithography", Extended Abstract of International Conference on Micro and Nano Engineering, Athens, Sep. 1997

13. Yongduk Seo, Jaewoong Lee, Bo-Kyoung Choi, Hee-Sang Kim and Ohyun Kim, "The Printing Conditions for 0.13m Features in X-Ray Lithography using Pohang Light Source", Extended Abstract of International Conference on Micro and Nano Engineering, Athens, Sep. 1997

12. Moonsuk Yi, Ohyun Kim, M. Khan, S. Bollepalli and F. Cerrina, "Qualification of Aerial Image in Sub-0.13 XRL", Extended Abstract of International Workshop on X-ray and Extreme Ultraviolet Lithography, Yokohama, July 1997

11. Ohyun Kim, "Current Status of X-ray Lithography Development at the Postech Advanced Lithography Center", Extended Abstract of International Workshop on X-ray and Extreme Ultraviolet Lithography, Yokohama, July 1997

10. Moonsuk Yi, Ohyun Kim, S. Bollepalli, M. Khan and F. Cerrina, "Evaluation of Aerial Image in XRL", Extended Abstract of SPIE's International Symposium on Micro lithography, Santa Clara, March 1997

9. Seo-Kyu Lee, Seong-Min Choe, Chang-Geun Ahn, Young-Bae Park, Wook-Jin Chung, Shi-Woo Rhee, Young Kyu Kwon, B.K.Kang and Ohyun Kim, "The Hydrogenation Effect of Heterostructured CMOS Thin-Film Transistors in LOW Temperature (500) RTCVD Films", Extended Abstract of the 190th Electrochemical Society Meeting, San Antonio, Oct. 1996, pp.692

8. Kee-Jong Kim and Ohyun Kim, "Staircase Charge-Pumping study of Trapping Centers at Grain-Boundary in Polysilicon Thin Film Transistors", Extended Abstract of the 190th Electrochemical Society Meeting, San Antonio, Oct. 1996, pp.679

7. Seo-Kyu Lee, Seong-Min Choe, Chang-Geun Ahn, Wook-Jin Chung, Young-Kyu Kwon, Bong-Koo Kang and Ohyun Kim, "Low Temperature (<500) CMOS Thin Film Transistors in RTCVD Poly-Sio.88Ge0.12Films", Extended Abstracts of the 1996 International Conference on Solid State Devices and Materials, Yokohama, Aug. 1996, pp.335-337

6. Kee-Jong Kim and Ohyun Kim, "Three-Level Charge-Pumping Techniques for Grain- Boundary Trap Evaluation in Polysilicon Thin-Film Transistors", Extended Abstracts of the 1996 International Conference on Solid State Devices and Materials, Yokohama, Aug. 1996, pp.329-331

5. Sung-Keun Chang and Ohyun Kim, "Low Temperature Polycrystalline Silicon Thin Film Transistors Having Titanium Disilicide Source and Drain Contacts", Proceedings of the 26th European solid state Device Research Conference, Bologna, Sep. 1996, pp.229-232

4. Seo-Kyu lee, H-G Kim, W-J Chung, B-K Kang and Ohyun Kim, "PMOS Thin Film Transistors Fabricated in RTCVD Polycrystalline Silicon Germanium Films", The 1995 International Conference on Solid State Device and Materials, Osaka, Aug. 1995, pp.539-541

3. Kee-Jong Kim, Seong-Gyun Kim, Won-Kyu Park and Ohyun Kim, "A New Charge Pumping Model in Polysilicon Thin Film Transistor", Extended Abstracts of the IEEE Region 10 International Conference on Microelectronics and VLSI, Hong Kong, Nov. 1995, pp.48-51

2. P.S.D. Lin, W.P. Hong and Ohyun Kim, "A sub-micron FET V gate process for high performance field effect transistor", IEEE 1990 workshop on micrometer and sub-micrometer lithography, New Orleans, Jan. 1990

1. D.Y. Yang, Ohyun Kim, H.G. Lee, J. Partanen, T. Tuomi and S. Hahn, "Effects of various pre-intrinsic and phosphorus gettering treatments upon quality of neat surface region in CZ silicon wafer during a simulated 4 MB DRAM process", The Electro-Chemical Society Meeting, Montreal, Quebec Canada, May 1990